NCF - Nanotechnology Core Facility

Photolithography

	SU-8 (negative)
	Process Guidelines from MicroChem: Formulations 2-25 Formulations 25-75 SU-8 Removal by RIE

	AZ 5214-E (standard & image reversal)
	Process parameters AZ 5214-E Standard Process parameters AZ 5214-E Image Reversal Chemicals' Data: KWIKSTRIP Photoresist Remover 400K - Inorganic Developer AZ 5214-E Photoresist Technical Parameters

	Shipley 1818 (positive)
	Process parameters Shipley 1818 Chemicals' Data: S1800-series Photoresist 1165 Photoresist Remover 1112A Photoresist Remover Microposit 351 Developer Concentrate