Monday, October 13, 2008
   



MEMS Workshops and Seminars @ NCF

 

If you are interested in any of NCF's workshops/seminars, please contact Hongjun Zeng hzeng@uic.edu.
Please check the trainings schedule for specific process or piece of equipment.
Trainings and workshops are scheduled upon request, unless stated otherwise.
Seminar and workshop announcements are posted via CAMNA mailing system.

Hands-on Short MEMS Workshops [follow the links to see equipment used]

3 hour Photolithography/Etch Hands-on Demo S
cheduled each second Wednesday of the month.
1-day Fabricate Metal "Snake" Resistors

2-day Fabricate Mold and PDMS Stamp
2-day Fabricate Si3N4 membranes
2-day Fabricate Mold and Parylene Stamp
5-day Fabricate Micro-IR lamps on Si3N4 Membranes

All workshops have a minimum of 3 persons, and maximum of 6 (the maximum will depend on the student backgrounds). We will repeat classes as often as necessary to accommodate the demand in the region.

The costs are:
3 hour demo is FREE but contributions are welcome
[suggested contribution: $100 non-profit, $200 industrial]
1-day $400 non-profit; $800 industrial
2-day $700 non-profit; $1,400 industrial
5-day $1,500 non-profit; $3,000 industrial

 

"Introduction to MEMS/Nano Technology" Lecture

For those who want to learn the basics of MEMS and Nano fabrication technology. The course can be tailored to specific needs, ranging from 1 to 4 hours, covering the processes in different depth. The cost will be quoted upon request. Minimum of 10 persons. Please contact Hongjun Zeng hzeng@uic.edu for more information.


MEMS Related Courses at UIC

MEMS workshops details:

FREE 3 hour Photolithography/Etch Hands-on Demo

During this mini-workshop students will perform
simple photolithography and wet etch sequence.
The mini-workshop is scheduled each second
Wednesday of the month.

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1-day Fabricate Metal "Snake" Resistors

Cleanroom basics and chemical safety
E-beam metal evaporation
Mid-UV photolithography
Wet isotropic etching
Contact and/or Optical profilometry
Dicing [optional]

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2-day Fabricate Mold and PDMS Stamp

Cleanroom basics and chemical safety
Mid-UV thick resist photolithography
Linewidth measurement
Optical profilometry
Thick film thickness measurement

Preparation of PDMS mixture, and mold
PDMS curing

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2-day Fabricate Si3N4 membranes

Cleanroom basics and chemical safety
LPCVD low-stress nitride deposition
Thin film thickness measurement
Thin film stress measurement
Mid-UV photolithography
Linewidth measurement
Reactive Ion Etching
Anisotropic silicon etch
Contact and Optical profilometry

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2-day Fabricate Mold and Parylene Stamp

Cleanroom basics and chemical safety
Mid-UV thick resist photolithography
Linewidth measurement
Optical profilometry
Thick film thickness measurement

Parylene C deposition
Contact profilometry

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5-day Fabricate Micro-IR lamps on Si3N4 Membranes

Cleanroom basics and chemical safety
Wafer cleaning
Thermal oxidation
Thin film thickness measurement
Thin film stress measurement
E-beam metal evaporation
Mid-UV photolithography
Linewidth measurement
LPCVD low-temperature oxide deposition
Wet etch
Anisotropic silicon etch
Reactive Ion Etching
Contact and Optical profilometry
Dicing
Electrical Testing of devices

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Webmaster : Joshua Sautner
E-mail: jsautn2@uic.edu